Method and system for monitoring a semiconductor wafer plasma etch process
A Standard patent application filed on 03 October 2002 credited to Maltabes, John ; Mautz, Karl ; Petrucci, Joseph

Details

Application number :

2002341995  

Application type :

Standard  

Application status :

WITHDRAWN  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and system for monitoring a semiconductor wafer plasma etch process  

Inventor :

Maltabes, John ; Mautz, Karl ; Petrucci, Joseph  

Agent name :

 

Address for service :

 

Filing date :

03 October 2002  

Associated companies :

 

Applicant name :

MOTOROLA INC.  

Applicant address :

1303 East Algonquin Road, Schaumburg, IL 60196  

Old name :

 

Original Source :

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