Method for feeding purge gas to exposure apparatus, exposure apparatus, and method for manufacturing device
A Standard patent application filed on 23 October 2002 credited to Owa, Soichi
;
Nishikawa, Jin
Details
Application number :
2002336294
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method for feeding purge gas to exposure apparatus, exposure apparatus, and method for manufacturing device
Inventor :
Owa, Soichi
;
Nishikawa, Jin
Agent name :
Address for service :
Filing date :
23 October 2002
Associated companies :
Applicant name :
NIKON CORPORATION
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331