Method and apparatus for sputter deposition of epilayers with high deposition rate
A Standard patent application filed on 27 September 2002 credited to Chistyakov, Roman

Details

Application number :
2002334713  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method and apparatus for sputter deposition of epilayers with high deposition rate  
Inventor :
Chistyakov, Roman  
Agent name :
 
Address for service :
 
Filing date :
27 September 2002  
Associated companies :
 
Applicant name :
CHISTYAKOV, Roman  
Applicant address :
123 Elm Street, Andover, MA 17080  
Old name :
 
Original Source :
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Same Inventor