Uniform patterning for deep reactive ion etching
A Standard patent application filed on 17 September 2002 credited to Smith, Barry L. ; Corso, Thomas N. ; Schultz, Gary A. ; Alpha, Christopher G.

Details

Application number :

2002326941  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Uniform patterning for deep reactive ion etching  

Inventor :

Smith, Barry L. ; Corso, Thomas N. ; Schultz, Gary A. ; Alpha, Christopher G.  

Agent name :

 

Address for service :

 

Filing date :

17 September 2002  

Associated companies :

 

Applicant name :

ADVION BIOSCIENCES, INC.  

Applicant address :

15 Catherwood Road, Ithaca, NY 14850  

Old name :

 

Original Source :

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