Enhanced ion beam etch selectivity of magnetic thin films using carbon-based gases
A Standard patent application filed on 12 August 2002 credited to Singleton, Eric W. ; Minor, Michael K. ; Seigler, Michael A. ; Covington, Mark W.

Details

Application number :

2002323114  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Enhanced ion beam etch selectivity of magnetic thin films using carbon-based gases  

Inventor :

Singleton, Eric W. ; Minor, Michael K. ; Seigler, Michael A. ; Covington, Mark W.  

Agent name :

 

Address for service :

 

Filing date :

12 August 2002  

Associated companies :

 

Applicant name :

SEAGATE TECHNOLOGY LLC  

Applicant address :

920 Disc Drive, Scotts Valley, CA 95066  

Old name :

 

Original Source :

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