Method of manufacturing a semiconductor structure comprising sic on an oxide layer
A Standard patent application filed on 17 July 2002 credited to Guo, Shuwen
;
Eriksen, Odd Harald Steen
Details
Application number :
2002320606
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method of manufacturing a semiconductor structure comprising sic on an oxide layer