Apparatus and method for controlling galvanic corrosion effects on a single-wafer cleaning system
A Standard patent application filed on 11 July 2002 credited to Boyd, John M. ; Ravkin, Mike ; Mikhaylich, Katrina A.

Details

Application number :

2002318307  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Apparatus and method for controlling galvanic corrosion effects on a single-wafer cleaning system  

Inventor :

Boyd, John M. ; Ravkin, Mike ; Mikhaylich, Katrina A.  

Agent name :

 

Address for service :

 

Filing date :

11 July 2002  

Associated companies :

 

Applicant name :

LAM RESEARCH CORPORATION  

Applicant address :

4650 Cushing Parkway, Fremont, CA 94538  

Old name :

 

Original Source :

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