Feedforward and feedback control for conditioning of chemical mechanical polishing pad
A Standard patent application filed on 17 June 2002 credited to Paik, Young Joseph

Details

Application number :

2002316260  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Feedforward and feedback control for conditioning of chemical mechanical polishing pad  

Inventor :

Paik, Young Joseph  

Agent name :

 

Address for service :

 

Filing date :

17 June 2002  

Associated companies :

 

Applicant name :

APPLIED MATERIALS, INC.  

Applicant address :

P.O. Box 450A, Santa Clara, CA 95052  

Old name :

 

Original Source :

Go  

Same Inventor

• Control of chemical mechanical polishing pad conditioner...