Method and apparatus for dimension measurement of a pattern formed by lithographic exposure tools
A Standard patent application filed on 24 April 2002 credited to Johnson, Eric R.
;
Slonaker, Steve
;
Grodnensky, Ilya
Details
Application number :
2002309596
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method and apparatus for dimension measurement of a pattern formed by lithographic exposure tools
Inventor :
Johnson, Eric R.
;
Slonaker, Steve
;
Grodnensky, Ilya