Patterning compositions using e-beam lithography and structures and devices made thereby
A Standard patent application filed on 07 June 2002 credited to Lavallee, Guy P.
;
Lee, Youngchul
;
Catchmark, Jeffrey M.
Details
Application number :
2002305893
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Patterning compositions using e-beam lithography and structures and devices made thereby
Inventor :
Lavallee, Guy P.
;
Lee, Youngchul
;
Catchmark, Jeffrey M.