E-Beam/Microwave Gas Jet PECVD Method and Apparatus for Depositing and/or Surface Modification of Thin Film Materials
A Standard patent application filed on 23 September 2002 credited to Doehler, Joachim
;
Jones, Scott
;
Izu, Masatsugu
Details
Application number :
2002301168
Application type :
Standard
Application status :
WITHDRAWN
Under opposition :
No
Proceeding type :
Invention title :
E-Beam/Microwave Gas Jet PECVD Method and Apparatus for Depositing and/or Surface Modification of Thin Film Materials
Inventor :
Doehler, Joachim
;
Jones, Scott
;
Izu, Masatsugu
Agent name :
Davies Collison Cave
Address for service :
1 Nicholson Street Melbourne VIC 3000 Australia
Filing date :
23 September 2002
Associated companies :
Applicant name :
Energy Conversion Devices, Inc.
Applicant address :
1675 W. Maple Road Troy Michigan 48084 United States of America