Method for deep and vertical dry etching of dielectrics
A Standard patent application filed on 28 May 2002 credited to Delage, Andre ; Lamontagne, Boris ; Xu, Dan-Xia ; Charbonneau, Sylvain ; Cheben, Pavel ; Janz, Siegfried ; Erickson, Lynden

Details

Application number :
2002257469  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method for deep and vertical dry etching of dielectrics  
Inventor :
Delage, Andre ; Lamontagne, Boris ; Xu, Dan-Xia ; Charbonneau, Sylvain ; Cheben, Pavel ; Janz, Siegfried ; Erickson, Lynden  
Agent name :
 
Address for service :
 
Filing date :
28 May 2002  
Associated companies :
 
Applicant name :
LNL TECHNOLOGIES CANADA INC.  
Applicant address :
283 McLeod Street, Ottawa, Ontario K2P 1A1  
Old name :
 
Original Source :
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Same Inventor