Polarization vector alignment for interference lithography patterning
A Standard patent application filed on 27 February 2002 credited to Kelsey, Adam F.
;
Leclerc, Mark A.
;
Macleod, Bruce D.
Details
Application number :
2002252136
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Polarization vector alignment for interference lithography patterning
Inventor :
Kelsey, Adam F.
;
Leclerc, Mark A.
;
Macleod, Bruce D.