Method of plasma etching low-k organosilicate materials
A Standard patent application filed on 21 March 2002 credited to Helmer, Bryan A.
;
Zhu, Helen H.
;
Li, Si Yi
;
Sadjadi, S. M. Reza
;
Tietz, James V.
Details
Application number :
2002250223
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method of plasma etching low-k organosilicate materials
Inventor :
Helmer, Bryan A.
;
Zhu, Helen H.
;
Li, Si Yi
;
Sadjadi, S. M. Reza
;
Tietz, James V.