Method of plasma etching low-k organosilicate materials
A Standard patent application filed on 21 March 2002 credited to Helmer, Bryan A. ; Zhu, Helen H. ; Li, Si Yi ; Sadjadi, S. M. Reza ; Tietz, James V.

Details

Application number :

2002250223  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of plasma etching low-k organosilicate materials  

Inventor :

Helmer, Bryan A. ; Zhu, Helen H. ; Li, Si Yi ; Sadjadi, S. M. Reza ; Tietz, James V.  

Agent name :

 

Address for service :

 

Filing date :

21 March 2002  

Associated companies :

 

Applicant name :

LAM RESEARCH CORPORATION  

Applicant address :

4650 Cushing Parkway, Fremont, CA 94538  

Old name :

 

Original Source :

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