Method of plasma etching organic antireflective coating
A Standard patent application filed on 21 March 2002 credited to Lee, Chris
;
Chiang, Conan
;
Jiang, Weinan
;
Lin, Frank Y.
;
Ni, Tuqiang
;
Lee, Dai N.
Details
Application number :
2002248539
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method of plasma etching organic antireflective coating
Inventor :
Lee, Chris
;
Chiang, Conan
;
Jiang, Weinan
;
Lin, Frank Y.
;
Ni, Tuqiang
;
Lee, Dai N.