Plasma processing method and apparatus with control of plasma excitation power
A Standard patent application filed on 29 March 2002 credited to Huang, Chung-Ho ; Jiang, Weinan ; Ni, Tuqiang ; Lin, Frank

Details

Application number :

2002247433  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Plasma processing method and apparatus with control of plasma excitation power  

Inventor :

Huang, Chung-Ho ; Jiang, Weinan ; Ni, Tuqiang ; Lin, Frank  

Agent name :

 

Address for service :

 

Filing date :

29 March 2002  

Associated companies :

 

Applicant name :

LAM RESEARCH CORPORATION  

Applicant address :

4650 Cushing Parkway, Fremont, CA 94538-6516  

Old name :

 

Original Source :

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