Magnetic field furnace and a method of using the same to manufacture semiconductor substrates
A Standard patent application filed on 28 December 2001 credited to Isozaki, Hideyuki
;
Fujita, Kentaro
;
Maishigi, Keiji
;
Glavish, Hilton, F.
Details
Application number :
2002246865
Application type :
Standard
Application status :
CEASED
Under opposition :
No
Proceeding type :
Invention title :
Magnetic field furnace and a method of using the same to manufacture semiconductor substrates