Sputter deposition of lithium phosphorous oxynitride material
A Standard patent application filed on 29 October 2001 credited to Lin, Chun-Ting ; Chang, Fan-Hsiu ; Krasnov, Victor ; Tang, Paul ; Ting, Su-Jen ; Nieh, Kai-Wei

Details

Application number :

2002234085  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Sputter deposition of lithium phosphorous oxynitride material  

Inventor :

Lin, Chun-Ting ; Chang, Fan-Hsiu ; Krasnov, Victor ; Tang, Paul ; Ting, Su-Jen ; Nieh, Kai-Wei  

Agent name :

 

Address for service :

 

Filing date :

29 October 2001  

Associated companies :

 

Applicant name :

Front Edge Technology, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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