Process and system for rinsing of semiconductor substrates
A Standard patent application filed on 03 December 1999 credited to Rosato, John J. ; Lindquist, Paul G. ; Olson, Curtis R. ; Fahrenkrug, Jane

Details

Application number :

20428  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Process and system for rinsing of semiconductor substrates  

Inventor :

Rosato, John J. ; Lindquist, Paul G. ; Olson, Curtis R. ; Fahrenkrug, Jane  

Agent name :

 

Address for service :

 

Filing date :

03 December 1999  

Associated companies :

 

Applicant name :

Scp Global Technologies, A Division of Preco, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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