Method and apparatus for measuring aberration of projection optical system, and method and apparatus for exposure
A Standard patent application filed on 21 November 2001 credited to Shiraishi, Naomasa

Details

Application number :

2002224059  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for measuring aberration of projection optical system, and method and apparatus for exposure  

Inventor :

Shiraishi, Naomasa  

Agent name :

 

Address for service :

 

Filing date :

21 November 2001  

Associated companies :

 

Applicant name :

Nikon Corporation  

Applicant address :

 

Old name :

 

Original Source :

Go  

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