Dissolution inhibitors in photoresist compositions for microlithography
A Standard patent application filed on 12 October 2001 credited to Feiring, Andrew F.
;
Schadt Iii, Frank L.
;
Petrov, Viacheslav Alexandrovich
;
Feldman, Jerald
;
Berger, Larry L.
;
Zumsteg Jr., Fredrick Claus
Details
Application number :
2002214632
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Dissolution inhibitors in photoresist compositions for microlithography
Inventor :
Feiring, Andrew F.
;
Schadt Iii, Frank L.
;
Petrov, Viacheslav Alexandrovich
;
Feldman, Jerald
;
Berger, Larry L.
;
Zumsteg Jr., Fredrick Claus