Wafer area pressure control for plasma confinement
A Standard patent application filed on 26 September 2001 credited to Ellingboe, Albert R. ; Taejoon, Han ; Benzing, David W.

Details

Application number :

2001296916  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Wafer area pressure control for plasma confinement  

Inventor :

Ellingboe, Albert R. ; Taejoon, Han ; Benzing, David W.  

Agent name :

 

Address for service :

 

Filing date :

26 September 2001  

Associated companies :

 

Applicant name :

Lam Reasearch Corporation  

Applicant address :

 

Old name :

 

Original Source :

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