Novel polymers and photoresist compositions comprising labile polymers backbonesfor short wave imaging
A Standard patent application filed on 08 September 2001 credited to Zampini, Anthony ; Cho, Sungseo ; Trefonas, Peter

Details

Application number :

2001288953  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Novel polymers and photoresist compositions comprising labile polymers backbonesfor short wave imaging  

Inventor :

Zampini, Anthony ; Cho, Sungseo ; Trefonas, Peter  

Agent name :

 

Address for service :

 

Filing date :

08 September 2001  

Associated companies :

 

Applicant name :

Shipley Company, L.L.C.  

Applicant address :

 

Old name :

 

Original Source :

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