Projection optical system, method for producing the same, and projection exposure apparatus using the same
A Standard patent application filed on 06 January 2000 credited to Tanaka, Issey ; Hiraiwa, Hiroyuki

Details

Application number :

18912  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Projection optical system, method for producing the same, and projection exposure apparatus using the same  

Inventor :

Tanaka, Issey ; Hiraiwa, Hiroyuki  

Agent name :

 

Address for service :

 

Filing date :

06 January 2000  

Associated companies :

 

Applicant name :

Nikon Corporation  

Applicant address :

 

Old name :

 

Original Source :

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