Apparatus and method for chemical mechanical polishing of substrates
A Standard patent application filed on 31 July 2001 credited to Oh, Hilario L. ; Suh, Nam P. ; Melvin, Jason

Details

Application number :

2001283529  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Apparatus and method for chemical mechanical polishing of substrates  

Inventor :

Oh, Hilario L. ; Suh, Nam P. ; Melvin, Jason  

Agent name :

 

Address for service :

 

Filing date :

31 July 2001  

Associated companies :

 

Applicant name :

Massachusetts Institute of Technology  

Applicant address :

 

Old name :

 

Original Source :

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