Etching apparatus having a confinement and guide object for gas flow of plasma and method for using same
A Standard patent application filed on 26 July 2001 credited to Johnson, Dave ; Sasserath, Jay ; Devre, Mike ; Mackenzie, Kenneth ; Lee, Jewon

Details

Application number :

2001283503  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Etching apparatus having a confinement and guide object for gas flow of plasma and method for using same  

Inventor :

Johnson, Dave ; Sasserath, Jay ; Devre, Mike ; Mackenzie, Kenneth ; Lee, Jewon  

Agent name :

 

Address for service :

 

Filing date :

26 July 2001  

Associated companies :

 

Applicant name :

Unaxis USA Inc.  

Applicant address :

 

Old name :

 

Original Source :

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