Method for an improved developing process in wafer photolithography
A Standard patent application filed on 25 July 2001 credited to Bang, Jung Suk ; Park, Jae Heon

Details

Application number :

2001277183  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method for an improved developing process in wafer photolithography  

Inventor :

Bang, Jung Suk ; Park, Jae Heon  

Agent name :

 

Address for service :

 

Filing date :

25 July 2001  

Associated companies :

 

Applicant name :

Silicon Valley Group Inc  

Applicant address :

 

Old name :

 

Original Source :

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