Method of making high-density, high-purity tungsten sputter targets
A Standard patent application filed on 19 November 1999 credited to Lo, Chi-Fung ; Gilman, Paul S. ; Draper, Darryl

Details

Application number :

18262  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of making high-density, high-purity tungsten sputter targets  

Inventor :

Lo, Chi-Fung ; Gilman, Paul S. ; Draper, Darryl  

Agent name :

 

Address for service :

 

Filing date :

19 November 1999  

Associated companies :

 

Applicant name :

Praxair S.T. Technology, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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