A method and device for improved salicide resistance on polysilicon gates
A Standard patent application filed on 04 November 1999 credited to Jan, Chia-Hong ; Tsai, Julie A. ; Yang, Simon ; Myers, Alan ; Whitehill, Kevin A. ; Keating, Steven J. ; Ghani, Tahir

Details

Application number :

18143  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

A method and device for improved salicide resistance on polysilicon gates  

Inventor :

Jan, Chia-Hong ; Tsai, Julie A. ; Yang, Simon ; Myers, Alan ; Whitehill, Kevin A. ; Keating, Steven J. ; Ghani, Tahir  

Agent name :

 

Address for service :

 

Filing date :

04 November 1999  

Associated companies :

 

Applicant name :

Intel Corporation  

Applicant address :

 

Old name :

 

Original Source :

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