Materials for polishing liquid for metal, polishing liquid for metal, method forpreparation thereof and polishing method using the same
A Standard patent application filed on 28 December 1999 credited to Uchida, Takeshi ; Hoshino, Tetsuya ; Terazaki, Hiroki ; Kondoh, Seiichi ; Koyama, Naoyuki ; Honma, Yoshio ; Kamigata, Yasuo

Details

Application number :

18043  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Materials for polishing liquid for metal, polishing liquid for metal, method forpreparation thereof and polishing method using the same  

Inventor :

Uchida, Takeshi ; Hoshino, Tetsuya ; Terazaki, Hiroki ; Kondoh, Seiichi ; Koyama, Naoyuki ; Honma, Yoshio ; Kamigata, Yasuo  

Agent name :

 

Address for service :

 

Filing date :

28 December 1999  

Associated companies :

 

Applicant name :

Hitachi Chemical Company, Ltd.  

Applicant address :

 

Old name :

 

Original Source :

Go