Plasma focus light source with active and buffer gas control
A Standard patent application filed on 07 June 2001 credited to Fomenkov, Igor V
;
Rauch, John E.
;
Partlo, William N
;
Ness, Richard M.
;
Melnychuk, Stephan T.
;
Sandstrom, Richard L
Details
Application number :
2001268288
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Plasma focus light source with active and buffer gas control
Inventor :
Fomenkov, Igor V
;
Rauch, John E.
;
Partlo, William N
;
Ness, Richard M.
;
Melnychuk, Stephan T.
;
Sandstrom, Richard L