Feed nozzle for gasification reactor for halogenated materials
A Standard patent application filed on 04 May 2001 credited to Lipp, Charles W. ; Salinas Iii, Leopoldo ; Jewell, Dennis W.

Details

Application number :

2001261201  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Feed nozzle for gasification reactor for halogenated materials  

Inventor :

Lipp, Charles W. ; Salinas Iii, Leopoldo ; Jewell, Dennis W.  

Agent name :

 

Address for service :

 

Filing date :

04 May 2001  

Associated companies :

 

Applicant name :

DOW GLOBAL TECHNOLOGIES INC.  

Applicant address :

Wasgington Street, 1790 Building Midland, MI 48674 United States of America  

Old name :

 

Original Source :

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