Method and arrangement for deposition of a semiconductor material
A Standard patent application filed on 12 November 1999 credited to Jager-Waldau, Arnulf A. ; Jurgensen, Holger ; Lux-Steiner, Martha Christina

Details

Application number :

17718  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and arrangement for deposition of a semiconductor material  

Inventor :

Jager-Waldau, Arnulf A. ; Jurgensen, Holger ; Lux-Steiner, Martha Christina  

Agent name :

 

Address for service :

 

Filing date :

12 November 1999  

Associated companies :

 

Applicant name :

Hahn-Meitner-Institut Berlin G.m.b.H.  

Applicant address :

 

Old name :

 

Original Source :

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