Treatment system for removing hazardous substances from a semiconductor process waste gas stream
A Standard patent application filed on 01 May 2001 credited to Hertzler, Christopher ; Korn, David ; Latam, Christopher

Details

Application number :

2001259335  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Treatment system for removing hazardous substances from a semiconductor process waste gas stream  

Inventor :

Hertzler, Christopher ; Korn, David ; Latam, Christopher  

Agent name :

 

Address for service :

 

Filing date :

01 May 2001  

Associated companies :

 

Applicant name :

Techarmonic, Inc.  

Applicant address :

 

Old name :

 

Original Source :

Go